Low-Temperature Resist Stripping Device "AURORA"
By eliminating the liquid medication cleaning process, it is possible to reduce the installation area of the wet bench!
"AURORA" is a low-temperature resist stripping device that can remove resist after ion implantation. By combining plasma treatment and ozone water treatment, it can strip without residue, and it also supports stripping of underlying films (such as Si, SiO2) without film edge issues. Additionally, by eliminating chemical cleaning processes such as sulfuric peroxide and ammonia peroxide, it is possible to reduce running costs and the number of processes. A fast removal rate (2-4μm/min) achieves high throughput. [Features] ■ Stripping performance ■ Cost reduction ■ Reduction of process steps ■ Reduction of installation area *For more details, please feel free to contact us.
- Company：HUGパワー
- Price：Other
